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WS 2015/16 - SoSe 2023

English

Technology for Thin Film Devices

6

Szyszka, Bernd

benotet

Mündliche Prüfung

Zugehörigkeit


Fakultät IV

Institut für Hochfrequenz und Halbleiter-Systemtechnologien

34325800 FG S-Professur Technologie für Dünnschicht-Bauelemente

No information

Kontakt


HFT 5-2

Szyszka, Bernd

bernd.szyszka@tu-berlin.de

Learning Outcomes

The students know the basic properties of the manufacturing of thin film devices and will be able to evaluate them. Futhermore, they know the fundamentals of coating processes, layer stacks and characterizatuin methods as well as applications of thin film devices.

Content

The course covers technological and application oriented aspects of thin film devices. Content of the course are atmospheric pressure and vacuum coating processes, plasma technologies, properties of thin films (electrical, optical and mechanical properties) and their dependance on the film structure, characterization methods and applications of thin film devices.

Module Components

Wahlpflicht:

1 from the following courses must be completed.

Course NameTypeNumberCycleLanguageSWSVZ
Fundamentals of Vacuum and Plasma Process TechnologiesVLSoSeEnglish2
Industrial Plasma TechnologiesVLSoSeEnglish2
Dünne SchichtenSEM3236 L 328WiSe/SoSeNo information2

Pflichtgruppe:

All Courses are mandatory.

Course NameTypeNumberCycleLanguageSWSVZ
Technology of Thin Film DevicesVL0431 L 007WiSe/SoSeNo information2

Workload and Credit Points

Technology of Thin Film Devices (VL):

Workload descriptionMultiplierHoursTotal
Präsenszeit15.02.0h30.0h
Vor-/Nachbereitung15.04.0h60.0h
90.0h(~3 LP)

Fundamentals of Vacuum and Plasma Process Technologies (VL):

Workload descriptionMultiplierHoursTotal
Präsenzzeit15.02.0h30.0h
Vor-/Nachbereitung15.04.0h60.0h
90.0h(~3 LP)

Industrial Plasma Technologies (VL):

Workload descriptionMultiplierHoursTotal
Präsenzzeit15.02.0h30.0h
Vor-/Nachbereitung15.04.0h60.0h
90.0h(~3 LP)

Dünne Schichten (SEM):

Workload descriptionMultiplierHoursTotal
Präsenzzeit15.02.0h30.0h
Vor-/Nachbereitung15.04.0h60.0h
90.0h(~3 LP)
The Workload of the module sums up to 180.0 Hours. Therefore the module contains 6 Credits.

Description of Teaching and Learning Methods

Das Wissen wird anhand von Vorlesungen und Seminaren vermittelt. Die Vorlesungsteilnehmer_innen organisieren sich in Gruppen, die semesterbegleitend selbständig vorgegebene Themen bearbeiten.

Requirements for participation and examination

Desirable prerequisites for participation in the courses:

Es werden Kenntnisse in den Grundlagen der Physik und Elektrotechnik erwartet. Grundlagen in der Chemie sind wünschenswert.

Mandatory requirements for the module test application:

This module has no requirements.

Module completion

Grading

graded

Type of exam

Oral exam

Language

English

Duration/Extent

No information

Duration of the Module

The following number of semesters is estimated for taking and completing the module:
1 Semester.

This module may be commenced in the following semesters:
Winter- und Sommersemester.

Maximum Number of Participants

This module is not limited to a number of students.

Registration Procedures

Nähere Informationen erhalten Sie unter http://www.tfd.tu-berlin.de und im ISIS-Kurs.

Recommended reading, Lecture notes

Lecture notes

Availability:  unavailable

 

Electronical lecture notes

Availability:  unavailable

 

Literature

Recommended literature
Milton Ohring, Materials Science of Thin Films, 978-0-12-524975-1

Assigned Degree Programs


This module is used in the following Degree Programs (new System):

Studiengang / StuPOStuPOsVerwendungenErste VerwendungLetzte Verwendung
This module is not used in any degree program.

Students of other degrees can participate in this module without capacity testing.

Miscellaneous

No information